Surface treatment by ion implantation (hardion™)

Our process enables the hardening of parts,
it can also significantly improve metal resistance to corrosion,
decrease friction losses, or tune the hydrophilicity of glass,
to give only a few benefits

Optical power:	up to 75 mW/cm²
Exposure area:	up to 300 x 300 mm²
Irradiance inhomogeneity:	max. 3%
Collimation angle:	0.8° to 2.6°
Exposure wavelength:	365 nm *
* Single-wavelength version optimized for i-line exposure. Mixed-wavelength exposure system available in option.

Products specifications may evolve. Visit our website to get up-to-date information. Contact us to obtain application-specific advices.

UV-LED exposure system
for photolithography

UV-LED technology is an attractive alternative to traditional arc lamp illumination. The benefits of UV-LEDs are manyfold and significant for photolithography. They operate with consistent emission for very long lifetimes, leading to low maintenance costs. UV-LED lamps are instant-start, and thus do not need several minutes to warm-up and stabilize.

Optics and Machine Vision solutions
From image processing algorithms to optical installations,
idonus provides partial or full machine vision solutions.

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Shadow Mask Aligner

with Double Image Microscope

Designed to accurately align masks with substrates for a wide range of application such as:

Shadow Masking

UV-light Masking

Nanoimprinting

Bonding Alignment

and more...

Sticking free MEMS release
Structure thinning
Dicing fee release of structures on SOI substrates
Etch-rate adjustable from 0 to about 30 um/h
Single side SiO2 etching (back-side protected during process)

Surface treatment by ion implantation (hardion™)

UV-LED exposure system for photolithography

Optics and Machine Vision solutions

Shadow Mask Aligner

with Double Image Microscope

HF Vapor Phase Etcher

UV-LED exposure system
for photolithography