idonus Sàrl, Hauterive, Switzerland

Watch this video on YouTube to discover the idonus UV-EXP Gen. 2

Discover the features of the idonus UV-EXP Gen. 2 exposure systems.

Improve your photolithography processes thanks to our next generation of UV-LED exposure systems

High-power LEDs offer exceptional stability of the irradiance spectrum over time due to their long lifespan. 

This guarantees increased reliability of photolithography processes and significantly reduces maintenance effort compared to mercury lamps.

Flexible composition of your UV spectrum is made extremely simple with the touch screen interface now included in our UV-EXP products.

Hereafter, we highlight several benefits of multi-wavelength LEDs in the case of thick film photolithography

Photoresist spectral sensitivity

The wavelength-dependent absorption coefficient of resists (spectral sensitivity) is an important factor in thick film lithography. To microstructure resists with steep sidewalls, one needs to get acquainted with optical absorption datasheets. So-called i-line resists are only sensitive in the range of the i-line (365 nm), a strong emission peak characteristic of mercury-based sources. Broadband resists also absorb the g- (435 nm, violet) and h- (405 nm) lines. Thus, they can also be exposed monochromatically within their spectral sensitivity. On the other hand, it is well known that mixed wavelengths are ideal for thicker resists. Besides theoretical aspects and technical know-how, process optimisation necessarily involves trial-and-error tuning steps. Finding an appropriate exposure recipe can therefore be tedious.

Exposure with multi-wavelength UV-LED

The task is considerably simplified thanks to multi-wavelength high-power LEDs. Imagine not having to change any optical filter anymore.  You also no longer need to worry about replacing and recalibrating your UV source all year round. From now on, you can switch on and off your exposure system at any time and as often as you like. With the idonus UV-LED exposure systems, you can furthermore adjust the spectral power distribution (SPD) of the UV source at the touch of a screen. Suppose you have completed a perfect exposure on Day 1. You can repeat that exposure on Day 100 and again on Day 1000 using exactly the same settings: You will each time get the same performance, no matter how many exposures were made in the meantime. With an idonus UV-EXP Gen. 2, you will get much more than with a mercury-based exposure system … without the drawbacks.

Spectral power distribution: UV-EXP150R-3LE

Example of four spectral irradiance curves measured at the output of an idonus UV-EXP150R-3LE 
The LED emission peaks are centred on the characteristic i-line (365 nm), h-line (405 nm) and g-line (435 nm). With a multi-wavelength LED, one can mimic the near-UV spectrum of a mercury-vapor lamp or adjust the levels of each peak as desired. 

Click on the link, to learn more about the idonus UV-EXP product line.

For more details or to request a quote, please get in touch with our sales team at: 

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idonus sàrl
Rouges-Terres 61
CH – 2068 Hauterive